Coloquio - Daniel Parisi - Atascos en flujo de partículas: Desde material granular a egreso de peatones
- 2020-07-16 14:00 |
- Vivo en YouTube
Carmen S. Menoni.
Jueves 7/8/2014, 14 hs.
Aula Seminario, 2do piso, Pabellón I.
With wavelengths of a few to tens of nanometers extreme ultraviolet (EUV) and soft x-ray (SXR) light is being exploited in a rapidly increasing number of scientific and technological applications, from imaging to spectroscopy, to the lithography of semiconductor chips with 13.5 nm wavelength light. Recent advances in the generation of bright EUV/SXR laser beams on a table top are opening unique opportunities to advance photonics in this challenging and relatively unexplored region of the electromagnetic spectrum. This presentation will review results of efforts at Colorado State University on the generation and utilization of EUV/SXR lasers for nanoscale imaging, nano-spectrometry imaging and nanopatterning. These photonic applications are making possible the imaging of nanostructures and their dynamics, the three dimensional nanoscale mapping of the chemical composition of organic and inorganic materials, and the printing of periodic arrays of nanoscale features error-free, providing new opportunities to access and probe the nanoworld.